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Event

SPIE Advanced Lithography 2016

Start Date : 2016/02/21

Termination date : 2016/02/25

City : San Jose, CA

Country : UNITED STATES

Website : ‎http://spie.org/x10942.xml

Description :

Present and publish at SPIE Advanced Lithography 2016, the world's premier semiconductor lithorgraphy event. For over 40 years, SPIE has brought together industry leaders to solve the latest challenges in lithography and patterning in the semiconductor industry.  

Main topics:

• Extreme Ultraviolet (EUV) Lithography

• Alternative Lithographic Technologies

• Metrology, Inspection, and Process Control for Microlithography

• Advances in Patterning Materials and Processes

• Optical Microlithography

• Design-Process-Technology Co-optimization for Manufacturability

• Advanced Etch Technology for Nanopatterning